Skip navigation
Utilize este identificador para referenciar este registo:

acessibilidade

http://hdl.handle.net/20.500.12207/576
wcag
Título: Influence of oxygen and free radicals promoters on the UV-254 nm photolysis of diclofenac
Autor: Rivas, Javier
Gimeno, Olga
Carvalhos, Maria Teresa Borralho
Beltrán, Fernando
Palavras-chave: Diclofenac
Photolysis
Quantum yield
Peroxides
Data: 15-Set-2010
Editora: Elsevier
Citação: Rivas, J., Gimeno, O., Borralho, T., & Beltrán, F. (2010). Influence of oxygen and free radicals promoters on the UV-254nm photolysis of diclofenac. Chemical Engineering Journal, 163(1), 35-40.
Resumo: Diclofenac has been irradiated under UV-C light at 254 nm. The effect of some operating variables has been investigated. The kinetics of the process has been analysed by means of the corresponding quantum yield. The presence of free radical promoters has also been considered. Diclofenac initial concentration plays an important role in its conversion profile. First order kinetics is ruled out under the applied experimental conditions. The process efficiency is significantly enhanced if oxygen is bubbled instead of air. Diclofenac quantum yield values in the range ≈0.1–0.3 mol Einstein−1 were obtained depending on the operating conditions used (air or oxygen) and the kinetic methodology followed. The mineralization level achieved also increased from 30 to 80% when oxygen was sparged instead of air. The presence of free radicals promoters did not improve the diclofenac removal efficiency.
Arbitragem científica: yes
URI: http://hdl.handle.net/20.500.12207/576
ISSN: 1385-8947
Versão do Editor: http://dx.doi.org/10.1016/j.cej.2010.07.027
Aparece nas coleções:D-TCA - Artigos em revistas com peer review

Ficheiros deste registo:
Não existem ficheiros associados a este registo.


FacebookTwitterDeliciousLinkedInDiggGoogle BookmarksMySpace
Formato BibTex MendeleyEndnote Currículo DeGóis 

Todos os registos no repositório estão protegidos por leis de copyright, com todos os direitos reservados.